David S Bergsman

ORCID

Publication Activity (10 Years)

Years Active: 2018-2021
Publications (10 Years): 7

Top Venues

ACS applied materials & interfaces

Nanoscale advances

Nano letters

Nature communications

University of Washington

Stanford University (PHD)

This page only lists publications with an associated author ORCID identifier.

Affiliation History

University of Washington Sep 01 2020

United States

Assistant Professor :: Chemical Engineering

Massachusetts Institute of Technology May 14 2018 - Aug 31 2020

United States

Postdoctoral Associate :: Research Laboratory of Electronics

Education History

Stanford University Aug 30 2012 - May 14 2018

United States

PHD :: Chemical Engineering

Publications

Anthony P Straub, David S Bergsman, Bezawit A Getachew, Liam M Leahy, Jatin J Patil, Nicola Ferralis, Jeffrey C Grossman
Highly Conductive and Permeable Nanocomposite Ultrafiltration Membranes Using Laser-Reduced Graphene Oxide. Nano letters 21 (6) (2021)
Asmita Jana, David S Bergsman, Jeffrey C Grossman
Adsorption-based membranes for air separation using transition metal oxides. Nanoscale advances 3 (15) (2021)
David S Bergsman, Bezawit A Getachew, Christopher B Cooper, Jeffrey C Grossman
Preserving nanoscale features in polymers during laser induced graphene formation using sequential infiltration synthesis. Nature communications 11 (1) (2020)
Dara Bobb-Semple, Li Zeng, Isvar A Cordova, David S Bergsman, Dennis Nordlund, Stacey F Bent
Substrate-Dependent Study of Chain Orientation and Order in Alkylphosphonic Acid Self-Assembled Monolayers for ALD Blocking. Langmuir : the ACS journal of surfaces and colloids 36 (43) (2020)
Bezawit A Getachew, David S Bergsman, Jeffrey C Grossman
Laser-Induced Graphene from Polyimide and Polyethersulfone Precursors as a Sensing Electrode in Anodic Stripping Voltammetry. ACS applied materials & interfaces 12 (43) (2020)
Richard G Closser, Mie Lillethorup, David S Bergsman, Stacey F Bent
Growth of a Surface-Tethered, All-Carbon Backboned Fluoropolymer by Photoactivated Molecular Layer Deposition. ACS applied materials & interfaces 11 (24) (2019)
Richard G Closser, David S Bergsman, Stacey F Bent
Molecular Layer Deposition of a Highly Stable Silicon Oxycarbide Thin Film Using an Organic Chlorosilane and Water. ACS applied materials & interfaces 10 (28) (2018)

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Publication Activity (10 Years)

Top Topics

Top Venues

David S Bergsman