Neelakandan M Santhosh

Scopus Author ID Scopus Author ID ORCID

Publication Activity (10 Years)

Years Active: 2018-2024
Publications (10 Years): 5

Top Topics

Molecularly Imprinted

Walled Carbon Nanotubes

Top Venues

Small (Weinheim an der Bergstrasse, Germany)

Nanomaterials (Basel, Switzerland)

This page only lists publications with an associated author ORCID identifier.

Publications

Elena Tatarova, Ana Dias, Plamen I Dankov, Jivko Kissovski, Ana Maria Botelho do Rego, Neli Bundaleska, Edgar Felizardo, Miroslav V Abrashev, Ana Maria Ferraria, Thomas Strunskus, Vasyl Shvalya, Neelakandan M Santhosh, Ivan Valeriev Ivanov, Martin Košiček, Janez Zavašnik, Luis Lemos Alves, Bruno Gonçalves, Uroš Cvelbar
Plasma-Driven Tuning of Dielectric Permittivity in Graphene. Small (Weinheim an der Bergstrasse, Germany) 20 (27) (2024)
Elena Tatarova, Ana Dias, Plamen I Dankov, Jivko Kissovski, Ana Maria Botelho do Rego, Neli Bundaleska, Edgar Felizardo, Miroslav V Abrashev, Ana Maria Ferraria, Thomas Strunskus, Vasyl Shvalya, Neelakandan M Santhosh, Ivan Valeriev Ivanov, Martin Košiček, Janez Zavašnik, Luis Lemos Alves, Bruno Gonçalves, Uroš Cvelbar
Plasma-Driven Tuning of Dielectric Permittivity in Graphene. Small (Weinheim an der Bergstrasse, Germany) (2024)
Neelakandan M Santhosh, Vasyl Shvalya, Martina Modic, Nataša Hojnik, Janez Zavašnik, Jaka Olenik, Martin Košiček, Gregor Filipič, Ibrahim Abdulhalim, Uroš Cvelbar
Label-Free Mycotoxin Raman Identification by High-Performing Plasmonic Vertical Carbon Nanostructures. Small (Weinheim an der Bergstrasse, Germany) 17 (49) (2021)
Neelakandan M Santhosh, Aswathy Vasudevan, Andrea Jurov, Gregor Filipič, Janez Zavašnik, Uroš Cvelbar
Oriented Carbon Nanostructures from Plasma Reformed Resorcinol-Formaldehyde Polymer Gels for Gas Sensor Applications. Nanomaterials (Basel, Switzerland) 10 (9) (2020)
Neelakandan M Santhosh, Gregor Filipič, Elena Tatarova, Oleg Baranov, Hiroki Kondo, Makoto Sekine, Masaru Hori, Kostya Ken Ostrikov, Uroš Cvelbar
Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges. Micromachines 9 (11) (2018)