Rongbo Zhao

Publication Activity (10 Years)

Years Active: 2023-2024
Publications (10 Years): 8

Top Topics

Machine Learning

Fluorescence Imaging

Top Venues

The journal of physical chemistry letters

ACS applied materials & interfaces

This page only lists publications with an associated author ORCID identifier.

Publications

Rongbo Zhao, Xiaolin Wang, Hong Xu, Yayi Wei, Xiangming He
Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterning. Nanoscale 16 (8) (2024)
Rongbo Zhao, Yayi Wei, Xiaolin Wang, Xiangming He, Hong Xu
Convolutional Neural Network-Assisted Photoresist Formulation Discriminator Design of a Contact Layer for Electron Beam Lithography. The journal of physical chemistry letters (2024)
Rongbo Zhao, Yayi Wei, Xiaolin Wang, Xiangming He, Hong Xu
Convolutional Neural Network-Assisted Photoresist Formulation Discriminator Design of a Contact Layer for Electron Beam Lithography. The journal of physical chemistry letters 15 (34) (2024)
Rongbo Zhao, Yayi Wei, Xiaolin Wang, Xiangming He, Hong Xu
Convolutional Neural Network-Assisted Photoresist Formulation Discriminator Design of a Contact Layer for Electron Beam Lithography. The journal of physical chemistry letters 15 (34) (2024)
Rongbo Zhao, Xiaolin Wang, Yayi Wei, Xiangming He, Hong Xu
Machine Learning Applied to Electron Beam Lithography to Accelerate Process Optimization of a Contact Hole Layer. ACS applied materials & interfaces 16 (17) (2024)
Rongbo Zhao, Xiaolin Wang, Hong Xu, Yayi Wei, Xiangming He
Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterning. Nanoscale (2024)
Rongbo Zhao, Xiaolin Wang, Yayi Wei, Xiangming He, Hong Xu
Machine Learning Applied to Electron Beam Lithography to Accelerate Process Optimization of a Contact Hole Layer. ACS applied materials & interfaces (2024)
Rongbo Zhao, Xiaolin Wang, Ziyu Hu, Hong Xu, Xiangming He
Critical dimension prediction of metal oxide nanoparticle photoresists for electron beam lithography using a recurrent neural network. Nanoscale 15 (33) (2023)