Sonia Castellanos (S Castellanos)

ResearcherID ORCID

Publication Activity (10 Years)

Years Active: 2020-2024
Publications (10 Years): 9

Top Venues

Physical chemistry chemical physics : PCCP

ACS applied materials & interfaces

ACS materials Au

ARCNL

This page only lists publications with an associated author ORCID identifier.

Affiliation History

ARCNL Feb 15 2016

Netherlands

Group Leader :: EUV Photoresists

Publications

Jarich Haitjema, Sonia Castellanos, Olivier Lugier, Ivan Bespalov, Rebecka Lindblad, Martin Timm, Christine Bülow, Vicente Zamudio-Bayer, J Tobias Lau, Bernd von Issendorff, Ronnie Hoekstra, Katharina Witte, Benjamin Watts, Thomas A Schlathölter, Albert M Brouwer
Soft X-ray absorption and fragmentation of tin-oxo cage photoresists. Physical chemistry chemical physics : PCCP 26 (7) (2024)
Jarich Haitjema, Sonia Castellanos, Olivier Lugier, Ivan Bespalov, Rebecka Lindblad, Martin Timm, Christine Bülow, Vicente Zamudio-Bayer, J Tobias Lau, Bernd von Issendorff, Ronnie Hoekstra, Katharina Witte, Benjamin Watts, Thomas A Schlathölter, Albert M Brouwer
Soft X-ray absorption and fragmentation of tin-oxo cage photoresists. Physical chemistry chemical physics : PCCP 26 (7) (2024)
Jarich Haitjema, Sonia Castellanos, Olivier Lugier, Ivan Bespalov, Rebecka Lindblad, Martin Timm, Christine Bülow, Vicente Zamudio-Bayer, J Tobias Lau, Bernd von Issendorff, Ronnie Hoekstra, Katharina Witte, Benjamin Watts, Thomas A Schlathölter, Albert M Brouwer
Soft X-ray absorption and fragmentation of tin-oxo cage photoresists. Physical chemistry chemical physics : PCCP (2024)
Neha Thakur, Michaela Vockenhuber, Yasin Ekinci, Benjamin Watts, Angelo Giglia, Nicola Mahne, Stefano Nannarone, Sonia Castellanos, Albert M Brouwer
Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance. ACS materials Au 2 (3) (2022)
Neha Thakur, Michaela Vockenhuber, Yasin Ekinci, Benjamin Watts, Angelo Giglia, Nicola Mahne, Stefano Nannarone, Sonia Castellanos, Albert M Brouwer
Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance. ACS materials Au 2 (3) (2022)
O Lugier, Neha Thakur, Lianjia Wu, M Vockenhuber, Y Ekinci, Sonia Castellanos
Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal-Organic Frameworks on Patterned Monolayers. ACS applied materials & interfaces 13 (36) (2021)
Lianjia Wu, Michiel F Hilbers, Olivier Lugier, Neha Thakur, Michaela Vockenhuber, Yasin Ekinci, Albert M Brouwer, Sonia Castellanos
Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography. ACS applied materials & interfaces 13 (43) (2021)
Jarich Haitjema, Lianjia Wu, Alexandre Giuliani, Laurent Nahon, Sonia Castellanos, Albert M Brouwer
UV and VUV-induced fragmentation of tin-oxo cage ions. Physical chemistry chemical physics : PCCP 23 (37) (2021)
Ivan Bespalov, Yu Zhang, Jarich Haitjema, Rudolf M Tromp, Sense Jan van der Molen, Albert M Brouwer, Johannes Jobst, Sonia Castellanos
Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography. ACS applied materials & interfaces 12 (8) (2020)

Sonia Castellanos.css-eqlu8i{font-size:small;padding-left:4px;} (S Castellanos)

Publication Activity (10 Years)

Top Topics

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Sonia Castellanos (S Castellanos)