Chemical Vapor Deposition of Phase-Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors.
Mark D StraubJennifer LeducMichael FrankAida RaaufTrevor D LohreyStefan G MinasianSanjay MathurJohn ArnoldPublished in: Angewandte Chemie (International ed. in English) (2019)
Homoleptic uranium(IV) amidate complexes have been synthesized and applied as single-source molecular precursors for the chemical vapor deposition of UO2 thin films. These precursors decompose by alkene elimination to give highly crystalline phase-pure UO2 films with an unusual branched heterostructure.
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