Geometrically-controlled evaporation-driven deposition of conductive carbon nanotube patterns on inclined surfaces.

Controllable accumulation of carbon nanotubes in self-assembly techniques is of critical importance in smart patterning and printed electronics. This study investigates how inclining the substrate and inhibiting the droplet spreading by sharp solid edges can affect the droplet contact angle and pinning time to improve the electrical conductivity and uniformity of the deposited patterns. Rectangular and circular pedestals were employed to investigate the effect of geometry on the deposition characteristics and to incorporate the gravitational effect by varying the substrate inclination angle. The results indicate that confining the droplet contact line to remain pinned to the pedestal edge can significantly alter the width, uniformity, and precision of the deposited patterns. These improvements correspond to the enhancement of the droplet pinning time (due to the edge effect) and to the further increase of the local evaporation rate near the contact line (due to the droplet elevation). By conducting experiments on different rectangular pedestals with varying solid-liquid interfacial areas and comparing their deposition characteristics, a rectangular pedestal with specific dimensions is selected in terms of pattern consistency and material usage efficiency. It is also shown that higher inclination angles further increase the deposited line accumulation density. Combining confinement and inclination techniques yields promising deposited patterns with high consistency and low resistivity, ranging from 8.75 kΩ mm -1 to a minimum of 0.63 kΩ mm -1 for a 3 × 6 mm 2 rectangular pedestal.