Special Issue "ALD Technique for Functional Coatings of Nanostructured Materials".

Javier Garcia FernándezVictor Vega MartínezVictor Manuel de la Prida Pidal

Published in: Nanomaterials (Basel, Switzerland) (2022)

Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer epitaxy method [...].

Keyphrases

optical coherence tomography
electron microscopy
room temperature
reduced graphene oxide
gold nanoparticles