Multi-band optical resonance of all-dielectric metasurfaces toward high-performance ultraviolet sensing.

All-dielectric sensors featuring low-loss resonances have been proposed instead of plasmonic-based sensors. However, reported dielectric-based sensors generally work in the visible and near-infrared regions and detect the intensity variation of resonant modes because the electromagnetic energy is mainly confined inside dielectric nanoparticles. It is a challenge to adjust the hotspots from the inside to the surface of the all-dielectric metasurface. In this study, highly uniform Si 3 N 4 all-dielectric metasurfaces have been successfully fabricated as sensing platforms by utilizing nanosphere self-assembly and plasma enhanced chemical vapor deposition techniques. Experimental and simulated results demonstrate that proposed Si 3 N 4 all-dielectric metasurfaces exhibit multiple optical resonant modes in the ultraviolet and visible wavelength and present distinct field-confinement in the gaps of nanoparticles. The hotspots have been successfully adjusted to the surface of Si 3 N 4 nanoparticles. Delightedly, Si 3 N 4 all-dielectric metasurfaces show characteristic wavelength shifts with variation of the refractive index, and the sensitivity can reach 707 nm per RIU for trace detection as sensing substrates. Proposed Si 3 N 4 all-dielectric metasurfaces are promising to act as high-sensitive sensing substrates in the ultraviolet and visible wavelength with the ease of high-throughput fabrication.