Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS.

Albert SantosoAfke DamenJ Ruud van Ommen Volkert van Steijn

Published in: Chemical communications (Cambridge, England) (2022)

We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface-subsurface coating of PDMS.

Keyphrases

particulate matter
ionic liquid
copy number
gene expression
dna methylation
air pollution
carbon dioxide
solar cells