Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition.
T JurcaA W PetersA R MouatO K FarhaJ T HuppTracy Lynn LohrMassimiliano DelferroTobin J MarksPublished in: Dalton transactions (Cambridge, England : 2003) (2018)
The synthesis of molybdenum oxo-amidinate complexes MoO2(R2AMD)2 [AMD = N,N'-di-R-acetamidinate; R = Cy (2; cyclohexyl) and iPr (3)], and their characterization by 1H, 13C NMR, X-ray diffraction, and thermogravimetric analysis is reported. Quartz-crystal microbalance and X-ray photoelectron spectroscopic studies confirm that 3 is an improved ALD precursor versus the R = t-butyl derivative for MoO3 film growth. Complex 3 is accessible in higher yields (80%+), is easier to handle without mass loss, and in conjunction with O3 as the second ALD reagent, yields nitride-free MoO3 films.
Keyphrases
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