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Voltage-Driven Fluorine Motion for Novel Organic Spintronic Memristor.

Abir NachawatyTongxin ChenFatima IbrahimYuchen WangYafei HaoKevin Dalla FrancescaPriyanka TyagiAntonio Da CostaAnthony FerriChuanchuan LiuXiaoguang LiMairbek ChshievSylvie MigotLaurent BadieWalaa JahjahRachel DesfeuxJean-Christophe Le BretonPhilippe SchiefferArnaud Le PottierThomas GriesXavier DevauxYuan Lu
Published in: Advanced materials (Deerfield Beach, Fla.) (2024)
Integrating tunneling magnetoresistance (TMR) effect in memristors is a long-term aspiration because it allows to realize multifunctional devices, such as multi-state memory and tunable plasticity for synaptic function. However, the reported TMR in different multiferroic tunnel junctions is limited to 100%. Here, we demonstrate a giant TMR of -266% in La 0.6 Sr 0.4 MnO 3 (LSMO)/poly(vinylidene fluoride)(PVDF)/Co memristor with thin organic PVDF barrier. Different from the ferroelectricity-based memristors, we discover that the voltage-driven F motion in the junction generates a huge reversible resistivity change up to 10 6 % with ns timescale. The removing F from PVDF layer suppresses the dipole field in the tunneling barrier, thereby significantly enhances the TMR. Furthermore, the TMR can be tuned by different polarizing voltage due to the strong modification of spin-polarization at the LSMO/PVDF interface upon F doping. The combining of high TMR in the organic memristor paves the way to develop high-performance multifunctional devices for storage and neuromorphic applications. This article is protected by copyright. All rights reserved.
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