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Evolution of Thin-Film Wrinkle Patterns on a Soft Substrate: Direct Simulations and the Effects of the Deformation History.

Siavash NikraveshYu-Lin Shen
Published in: Nanomaterials (Basel, Switzerland) (2022)
Surface wrinkling instability in thin films attached to a compliant substrate is a well-recognized form of deformation under mechanical loading. The influence of the loading history on the formation of instability patterns has not been studied. In this work, the effects of the deformation history involving different loading sequences were investigated via comprehensive large-scale finite element simulations. We employed a recently developed embedded imperfection technique which is capable of direct numerical predictions of the surface instability patterns and eliminates the need for re-defining the imperfection after each analysis step. Attention was devoted to both uniaxial compression and biaxial compression. We show that, after the formation of wrinkles, the surface patterns could still be eliminated upon complete unloading of the elastic film-substrate structure. The loading path, however, played an important role in the temporal development of wrinkle configurations. With the same final biaxial state, different deformation histories could lead to different surface patterns. The finding brings about possibilities for creating variants of wrinkle morphologies controlled by the actual deformation path. This study also offers a mechanistic rationale for prior experimental observations.
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