Factors contributing to halogen bond strength and stretch or contraction of internal covalent bond.

The halogen bond formed by a series of Lewis acids TF 3 X (T = C, Si, Ge, Sn, Pb; X = Cl, Br, I) with NH 3 is studied by quantum chemical calculations. The interaction energy is closely mimicked by the depth of the σ-hole on the X atom as well as the full electrostatic energy. There is a first trend by which the hole is deepened if the T atom to which X is attached becomes more electron-withdrawing: C > Si > Ge > Sn > Pb. On the other hand, larger more polarizable T atoms are better able to transmit the electron-withdrawing power of the F substituents. The combination of these two opposing factors leaves PbF 3 X forming the strongest XBs, followed by CF 3 X, with SiF 3 X engaging in the weakest bonds. The charge transfer from the NH 3 lone pair into the σ*(TX) antibonding orbital tends to elongate the covalent TX bond, and this force is largest for the heavier X and T atoms. On the other hand, the contraction of this bond deepens the σ-hole at the X atom, which would enhance both the electrostatic component and the full interaction energy. This bond-shortening effect is greatest for the lighter X atoms. The combination of these two opposing forces leaves the T-X bond contracting for X = Cl and Br, but lengthening for I.