Hydrogenation of silicon-nanocrystals-embedded silicon oxide passivating contacts.

We investigate the effect of hydrogen passivation of dangling bonds in silicon oxide passivating contacts with embedded silicon nanocrystals (NAnocrystalline Transport path in Ultra-thin dielectrics for REinforced passivation contact, NATURE contact). We first investigated the differences in electrical properties of the samples after hydrogen gas annealing (HGA) and hydrogen plasma treatment (HPT). The results show that the NATURE contact was efficiently passivated by hydrogen after HPT owing to the introduction of hydrogen radicals into the structure. Furthermore, we examined the dependence of process parameters such as HPT temperature, duration, and H2 pressure, on the electrical properties and hydrogen depth profiles. As a result, HPT at 500 °C, 15 min, and 0.5 Torr resulted in a large amount of hydrogen inside the NATURE contact and the highest implied open-circuit voltage of 724 mV. Contact resistivity and surface roughness hardly increased when HPT was performed under the optimized condition, which only improved the passivation performance without deteriorating the electron transport properties of the NATURE contact.