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Vertical Interconnection Technology for RF MicroSystem Packaging.

Yongfang HuWei SunYipeng SunChang-Feng Xia
Published in: Materials (Basel, Switzerland) (2024)
In this work, 1.5-level interconnections of RF microsystems with good RF performance, integration process compatibility, and high reliability are developed to meet the future demand for wireless communication microsystems in the millimeter wave band. Numerical models of 1.5-level interconnections based on solder balls with different diameters are established and analyzed using HFSS. The optimized structure parameters of 0.2 mm diameter Sn96.5Ag3Cu0.5 (SAC305) solder balls and 0.3 mm diameter Sn63Pb37 solder balls are selected for the interconnection between glass micro substrates and silicon micro substrates and between silicon micro substrates and HTCC substrates, respectively. Integration process parameters of the vertical interconnection are optimized. The micro substrate interconnection samples manufactured based on optimized integration methods and parameters show high reliability.
Keyphrases
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