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Computational Screening of Promising Deep-Ultraviolet Light Emitters.

Xun XuHan-Pu LiangQiu-Shi HuangZheng LiuBai-Qing ZhaoSi-Yuan XuChuan-Nan LiZi-Kai ZhouJinshan LiSu-Huai WeiXie Zhang
Published in: Journal of the American Chemical Society (2024)
Deep-ultraviolet (DUV) light sources are technologically highly important, but DUV light-emitting materials are extremely rare; AlN and its alloys are the only materials known so far, significantly limiting the chemical and structural spaces for materials design. Here, we perform a high-throughput computational search for DUV light emitters based on a set of carefully designed screening criteria relating to the sophisticated electronic structure. In this way, we successfully identify 5 promising material candidates that exhibit comparable or higher radiative recombination coefficients than AlN, including BeGeN 2 , Mg 3 NF 3 , KCaBr 3 , KHS, and RbHS. Further, we unveil the unique features in the atomic and electronic structures of DUV light emitters and elucidate the fundamental genetic reasons why DUV light emitters are extremely rare. Our study not only guides the design and synthesis of efficient DUV light emitters but also establishes the genetic nature of ultrawide-band-gap semiconductors in general.
Keyphrases
  • light emitting
  • high throughput
  • signaling pathway
  • genome wide
  • oxidative stress
  • gene expression
  • lps induced
  • cell proliferation
  • inflammatory response
  • single cell
  • pi k akt
  • nuclear factor