Use of Supramolecular Assemblies as Lithographic Resists.
Scott M LewisAntonio FernandezGuy A DeRoseMatthew S HuntGeorge F S WhiteheadAgnese LagzdaHayden R AltyJesus Ferrando-SoriaSarah VareyAndreas K KostopoulosFredrik SchedinChristopher A MurynGrigore A TimcoAxel SchererStephen G YeatesRichard E P WinpennyPublished in: Angewandte Chemie (International ed. in English) (2017)
A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high-resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.