Geometry of tellurene adsorbed on the Si(111)- R 30°-Sb surface from first principles calculations.

The 2D form of tellurium, named tellurene, is one of the latest discoveries in the family of 2D mono-elemental materials. In a trilayer configuration, free-standing tellurene was predicted theoretically to acquire two crystallographic forms, the α and β phases, corresponding to either a 1T-MoS 2 -like geometry or a trilayer slab exposing the Te(101̄0) surface of bulk Te with helical chains lying in-plane and further reconstructed due to the formation of interchain bonds. Either one or the other of the two phases was observed experimentally to prevail depending on the substrate they were grown onto. In the perspective to integrate tellurene on silicon, we here report an ab initio study of the adsorption of tellurene on the Si(111)- R 30° surface passivated by antinomy. According to the literature, this substrate is chosen for the growth of several tellurides by molecular beam epitaxy. The calculations reveal that on this substrate the adsorption energy mostly compensates the energy difference between the α and β phases in the free-standing configuration which suggests that the prevalence of one phase over the other might in this case strongly depend on the kinetics effects and deposition conditions.