Login / Signup

Investigation of the influence of oxygen plasma on supported silver nanoparticles.

Yichen DuanSana RaniJohn T NewbergAndrew V Teplyakov
Published in: Journal of vacuum science & technology. A, Vacuum, surfaces, and films : an official journal of the American Vacuum Society (2017)
Silver deposition precursor molecule trimethylphosphine(hexafluoroacetylacetonato)silver(I) [(hfac)AgP(CH3)3] was used to deposit silver onto water-modified (hydroxyl-terminated) solid substrates. A silicon wafer was used as a model flat surface, and water-predosed ZnO nanopowder was investigated to expand the findings to a common substrate material for possible practical applications. Following the deposition, oxygen plasma was used to remove the remaining organic ligands on a surface and to investigate its effect on the morphology of chemically deposited silver nanoparticles and films. A combination of microscopic and spectroscopic techniques including electron microscopy and x-ray photoelectron spectroscopy was used to confirm the change in the morphology of the deposited material consistent with Ostwald ripening as a result of plasma treatment. Particle agglomeration was observed on the surfaces, and the deposited metallic silver was oxidized to Ag2O following plasma treatment. The fluorine-containing ligands were completely removed. This result suggests that chemical vapor deposition can be used to deposit silver in a very controlled manner onto a variety of substrates using different topography methods and that the post-treatment with oxygen plasma is effective in preparing materials deposited for potential practical applications.
Keyphrases
  • silver nanoparticles
  • gold nanoparticles
  • electron microscopy
  • combination therapy
  • positron emission tomography
  • reduced graphene oxide
  • atomic force microscopy
  • low density lipoprotein