Controlled Self-Assembly of Polystyrene- block -Polydimethylsiloxane for Fabrication of Nanonetwork Silica Monoliths.

Herein, this work aims to carry out controlled self-assembly of single-composition block copolymer for the fabrication of various nanonetwork silica monoliths. With the use of lamellae-forming polystyrene- block -polydimethylsiloxane (PS- b -PDMS), nanonetwork-structured films could be fabricated by solvent annealing using a PS-selective solvent (chloroform). By simply tuning the flow rate of nitrogen purge to the PS-selective solvent for the controlled self-assembly of the PS- b -PDMS, gyroid- and diamond-structured monoliths can be formed due to the difference in the effective volume of PS in the PS- b -PDMS during solvent annealing. As a result, well-ordered nanonetwork SiO 2 (silica) monoliths can be fabricated by templated sol-gel reaction using hydrofluoric acid etched PS- b -PDMS film as a template followed by the removal of the PS. This bottom-up approach for the fabrication of nanonetwork materials through templated synthesis is appealing to create nanonetwork materials for various applications.