The Thermal Dissociation-Recombination Reactions of SiF 4 , SiF 3 , and SiF 2 : A Shock Wave and Theoretical Modeling Study.

Monitoring UV absorption signals of SiF 2 and SiF, the thermal dissociation reactions of SiF 4 and SiF 2 were studied in shock waves. Rationalizing the experimental observations by standard unimolecular rate theory in combination with quantum-chemical calculations of the reaction potentials, rate constants for the thermal dissociation reactions of SiF 4 , SiF 3 , and SiF 2 and their reverse recombination reactions were determined over broad temperature and pressure ranges. A comparison of fluorosilicon and fluorocarbon chemistry was finally made.