Nonvolatile Modulation of Bi 2 O 2 Se/Pb(Zr,Ti)O 3 Heteroepitaxy.
Yong-Jyun WangZi-Liang YangJia-Wei ChenRuixue ZhuShang-Hsien HsiehSen-Hao ChangHong-Yuan LinChun-Liang LinYi-Chun ChenChia-Hao ChenBo-Chao HuangYa-Ping ChiuChao-Hui YehPeng GaoPo-Wen ChiuYi-Cheng ChenYing-Hao ChuPublished in: ACS applied materials & interfaces (2024)
The pursuit of high-performance electronic devices has driven the research focus toward 2D semiconductors with high electron mobility and suitable band gaps. Previous studies have demonstrated that quasi-2D Bi 2 O 2 Se (BOSe) has remarkable physical properties and is a promising candidate for further exploration. Building upon this foundation, the present work introduces a novel concept for achieving nonvolatile and reversible control of BOSe's electronic properties. The approach involves the epitaxial integration of a ferroelectric PbZr 0.2 Ti 0.8 O 3 (PZT) layer to modify BOSe's band alignment. Within the BOSe/PZT heteroepitaxy, through two opposite ferroelectric polarization states of the PZT layer, we can tune the Fermi level in the BOSe layer. Consequently, this controlled modulation of the electronic structure provides a pathway to manipulate the electrical properties of the BOSe layer and the corresponding devices.