In-depth analysis of anisotropic magnetoconductance in Bi2Se3thin films with electron-electron interaction corrections.

A combination of out-of-plane (OOP) and in-plane (IP) magnetoconductance (MC) study in topological insulators (TI) is often used as an experimental technique to probe weak anti-localization (WAL) response of the topological surface states (TSSs). However, in addition to the above WAL response, weak localization (WL) contribution from conducting bulk states are also known to coexist and contribute to the overall MC; a study that has so far received limited attention. In this article, we accurately extract the above WL contribution by systematically analyzing the temperature and magnetic field dependency of conductivity in Bi2Se3films. For accurate analysis, we quantify the contribution of electron-electron interactions to the measured MC which is often ignored in the WAL studies. Moreover, we show that the WAL effect arising from the TSSs with finite penetration depth, for OOP and IP magnetic field can together explain the anisotropic magnetoconductance (AMC) and, thus, the investigated AMC study can serve as a useful technique to probe the parameters like phase coherence length and penetration depth that characterise the TSSs in 3D TIs. We also demonstrate that increase in bulk-disorder, achieved by growing the films on amorphous SiO2substrate rather than on crystalline Al2O3(0001), can lead to stronger decoupling between the top and bottom surface states of the film.