Low-Temperature Synthesis of WSe 2 by the Selenization Process under Ultrahigh Vacuum for BEOL Compatible Reconfigurable Neurons.
S S Teja NibhanupudiAnupam RoySayema ChowdhuryRyan SchalipMatthew J CoupinKevin C MatthewsMd Hasibul AlamBiswarup SatpatiHema C P MovvaChristopher J LuthSiyu WuJamie H WarnerSanjay K BanerjeePublished in: ACS applied materials & interfaces (2024)
Low-temperature large-area growth of two-dimensional (2D) transition-metal dichalcogenides (TMDs) is critical for their integration with silicon chips. Especially, if the growth temperatures can be lowered below the back-end-of-line (BEOL) processing temperatures, the Si transistors can interface with 2D devices (in the back end) to enable high-density heterogeneous circuits. Such configurations are particularly useful for neuromorphic computing applications where a dense network of neurons interacts to compute the output. In this work, we present low-temperature synthesis (400 °C) of 2D tungsten diselenide (WSe 2 ) via the selenization of the W film under ultrahigh vacuum (UHV) conditions. This simple yet effective process yields large-area, homogeneous films of 2D TMDs, as confirmed by several characterization techniques, including reflection high-energy electron diffraction, atomic force microscopy, transmission electron microscopy, and different spectroscopy methods. Memristors fabricated using the grown WSe 2 film are leveraged to realize a novel compact neuron circuit that can be reconfigured to enable homeostasis.