Fermi Pressure and Coulomb Repulsion Driven Rapid Hot Plasma Expansion in a van der Waals Heterostructure.
Junho ChoiJacob EmbleyDaria D BlachRaül Perea-CausínDaniel ErkenstenDong Seob KimLong YuanWoo Young YoonTakashi TaniguchiKenji WatanabeKeiji UenoEmanuel TutucSamuel BremErmin MalicXiaoqin LiLibai HuangPublished in: Nano letters (2023)
Transition metal dichalcogenide heterostructures provide a versatile platform to explore electronic and excitonic phases. As the excitation density exceeds the critical Mott density, interlayer excitons are ionized into an electron-hole plasma phase. The transport of the highly non-equilibrium plasma is relevant for high-power optoelectronic devices but has not been carefully investigated previously. Here, we employ spatially resolved pump-probe microscopy to investigate the spatial-temporal dynamics of interlayer excitons and hot-plasma phase in a MoSe 2 /WSe 2 twisted bilayer. At the excitation density of ∼10 14 cm -2 , well exceeding the Mott density, we find a surprisingly rapid initial expansion of hot plasma to a few microns away from the excitation source within ∼0.2 ps. Microscopic theory reveals that this rapid expansion is mainly driven by Fermi pressure and Coulomb repulsion, while the hot carrier effect has only a minor effect in the plasma phase.