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Role of Nitrogen and Yttrium Contents in Manufacturing (Cr, Y)N x Film Nanostructures.

Raíra Chefer ApolinárioAlisson Mendes RodriguesPedro Renato Tavares AvilaJúlia Nascimento PereiraCarlos Alberto Ospina RamirezPhilipp DaumFabiana Pereira da CostaHélio de Lucena LiraGelmires de Araújo NevesChristian GreinerHaroldo Cavalcanti Pinto
Published in: Nanomaterials (Basel, Switzerland) (2022)
The high-power impulse magnetron sputtering (HiPIMS) technique was applied to deposit multilayer-like (Cr, Y)N x coatings on AISI 304L stainless steel, using pendular substrate oscillation and a Cr-Y target and varying the nitrogen flow rate from 10 to 50 sccm. The microstructure, mechanical and tribological properties were investigated by scanning and transmission electron microscopy, X-ray photoelectron spectroscopy, X-ray diffraction, instrumented nano-hardness, and wear tests. The columnar grain structure became highly segmented and nanosized due to pendular substrate oscillation and the addition of yttrium. The deposition rate increased continuously with the growing nitrogen flow rate. The increase in nitrogen flow from 10 to 50 sccm increased the hardness of the coatings (Cr, Y)N x , with a maximum hardness value of 32.7 GPa for the coating (Cr, Y)N x with a nitrogen flow of 50 sccm, which greatly surpasses the hardness of CrN films with multilayer-like (Cr, Y)N x coatings architecture. The best mechanical and tribological performance was achieved for a nitrogen flow rate of 50 sccm. This was enabled by more elevated compressive stresses and impact energies of the impinging ions during film growth, owing to an increase of HiPIMS peak voltage with a rising N2/Ar ratio.
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