The Atomic Oxygen Erosion Resistance Effect and Mechanism of the Perhydropolysilazane-Derived SiOx Coating Used on Polymeric Materials in Space Environment.

In this work, the atomic oxygen (AO) erosion-resistance effect and mechanism of the Perhydropolysilazane (PHPS) coating were investigated from the perspective of element distribution in the depth direction. The results revealed that the coating demonstrated good adhesion and intrinsic AO erosion-resistance, which was attributed to the composition gradient formed in the coating. Moreover, the oxygen ratio of the SiOx on top layer of the coating could be elevated during AO exposure, strengthening the Ar ion etching durability of the coating. According to these results, an AO erosion-resistance mechanism model of the PHPS-derived SiOx coating was finally obtained.