Optically Patternable Metamaterial Below Diffraction Limit.
Youngseop LeeSang-Gil ParkSeokJae YooMinhee KangSang Chul JeonYoung-Su KimQ-Han ParkKi-Hun JeongPublished in: ACS applied materials & interfaces (2017)
We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range, which enables the surface plasmon excitation for the clear photolithographic definition of minimum feature size of 70 nm (≲ λ/5) beyond the near-field zone. This new metamaterial provides a new class of photoresist for ultraviolet nanolithography below the diffraction limit.
Keyphrases
- solid state
- gold nanoparticles
- light emitting
- crystal structure
- deep learning
- electron microscopy
- silver nanoparticles
- magnetic resonance
- machine learning
- photodynamic therapy
- high resolution
- energy transfer
- density functional theory
- magnetic resonance imaging
- metal organic framework
- high efficiency
- quantum dots
- neural network