Two Functions from a Single Photoresist: Tuning Microstructure Degradability from Light-Stabilized Dynamic Materials.

We introduce a photoresist - based on a light-stabilized dynamic material driven by an out-of-equilibrium photo-Diels-Alder reaction of triazolinediones with naphthalenes - whose ability to intrinsically degrade post-printing can be tuned by a simple adjustment of laser intensity during 3D laser lithography. Our resist's ability to form stable networks under green light irradiation that degrade in the dark was transformed into a tuneable degradable 3D printing materials platform. In-depth characterization of the printed microstructures via AFM before and during degradation revealed the high dependency of the final structures' properties on the writing parameters. Upon identifying the ideal writing parameters and their effect on the network structure, we are able to selectively toggle between stable and fully degradable structures simplifying the direct laser writing manufacturing process of multi-functional materials significantly, which typically requires the use of separate resists and consecutive writing efforts to achieve degradable and non-degradable material sections. This article is protected by copyright. All rights reserved.