Interfacial Defect-Mediated Near-Infrared Silicon Photodetection with Metal Oxides.

Due to recent breakthroughs in silicon photonics, sub-band-gap photodetection in silicon (Si) has become vital to the development of next-generation integrated photonic devices for telecommunication systems. In particular, photodetection in Si using complementary metal-oxide semiconductor (CMOS) compatible materials is in high demand for cost-effective integration. Here, we achieve broad-band near-infrared photodetection in Si/metal-oxide Schottky junctions where the photocurrent is generated from interface defects induced by aluminum-doped zinc oxide (AZO) films deposited on a Si substrate. The combination of photoexcited carrier generation from both interface defect states and intrinsic Si bulk defect states contributes to a photoresponse of 1 mA/W at 1325 nm and 0.22 mA/W at 1550 nm with zero-biasing. From a fit to the Fowler equation for photoemission, we quantitatively determine the individual contributions from these effects. Finally, using this analysis, we demonstrate a gold-nanoparticle-coated photodiode that has three distinct photocurrent responses resulting from hot carriers in the gold, interface defects from the AZO, and bulk defects within the Si. The hot carrier response is found to dominate near the band gap of Si, while the interface defects dominate for longer wavelengths.