Thermal atomic layer deposition of In 2 O 3 thin films using a homoleptic indium triazenide precursor and water.

Indium oxide (In 2 O 3 ) is an important transparent conducting material widely used in optoelectronic applications. Herein, we study the deposition of In 2 O 3 by thermal atomic layer deposition (ALD) using our recently reported indium(III) triazenide precursor and H 2 O. A temperature interval with self-limiting growth was found between ∼270 and 385 °C with a growth per cycle of ∼1.0 Å. The deposited films were polycrystalline cubic In 2 O 3 with In : O ratios of 1 : 1.2, and low levels of C and no detectable N impurities. The transmittance of the films was found to be >70% in visible light and the resistivity was found to be 0.2 mΩ cm. The high growth rates, low impurities, high optical transmittance, and low resistivity of these films give promise to this process being used for ALD of In 2 O 3 films for future microelectronic displays.