Facile preparation of Hf 3 N 4 thin films directly used as electrodes for lithium-ion storage.

Transition-metal nitride thin-film electrodes are potential electrode materials for all-solid-state thin-film lithium-ion batteries. In this study, orthorhombic Hf 3 N 4 thin-film electrodes applied in lithium-ion batteries were fabricated by the magnetron sputtering deposition of Hf followed by N 2 plasma immersion and post-annealing for the first time. This electrode material without additives such as binders and conductive agents exhibited a high specific capacity, high cycling stability, and excellent rate performance. At a current density of 0.1 A g -1 , the initial discharge capacity was 583.2 mA h g -1 and the stable Coulombic efficiency was 96.6%. At a high current density of 2 A g -1 , the Hf 3 N 4 thin-film electrodes could still provide a stable discharge capacity of about 260 mA h g -1 and Coulombic efficiency close to 100%. By analyzing the cyclic voltammetry curves at different scan rates, it was found that the Li + storage in Hf 3 N 4 thin-film electrodes was mainly contributed by a pseudo-capacitance mechanism.