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Observation of Rich Defect Dynamics in Monolayer MoS 2 .

Harikrishnan RavichandranTheresia KnoblochAndrew PannoneAlexander KarlBernhard StampferDominic WaldhoerYikai ZhengNajam U SakibMuhtasim Ul Karim SadafRahul PendurthiRiccardo TorsiJoshua A RobinsonTibor GrasserSaptarshi Das
Published in: ACS nano (2023)
Defects play a pivotal role in limiting the performance and reliability of nanoscale devices. Field-effect transistors (FETs) based on atomically thin two-dimensional (2D) semiconductors such as monolayer MoS 2 are no exception. Probing defect dynamics in 2D FETs is therefore of significant interest. Here, we present a comprehensive insight into various defect dynamics observed in monolayer MoS 2 FETs at varying gate biases and temperatures. The measured source-to-drain currents exhibit random telegraph signals (RTS) owing to the transfer of charges between the semiconducting channel and individual defects. Based on the modeled temperature and gate bias dependence, oxygen vacancies or aluminum interstitials are probable defect candidates. Several types of RTSs are observed including anomalous RTS and giant RTS indicating local current crowding effects and rich defect dynamics in monolayer MoS 2 FETs. This study explores defect dynamics in large area-grown monolayer MoS 2 with ALD-grown Al 2 O 3 as the gate dielectric.
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