Lowering Band Gap of an Electroactive Metal-Organic Framework via Complementary Guest Intercalation.
Zhiyong GuoDillip K PandaMonica A GordilloAmina KhatunHui WuWei ZhouSourav SahaPublished in: ACS applied materials & interfaces (2017)
A new honeycomb-shaped electroactive metal-organic framework (MOF) has been constructed from an electron deficient naphthalenediimide (NDI) ligand equipped with two terminal salicylic acid groups. π-Intercalation of electron-rich planar tetrathiafulvalene (TTF) guests between the NDI ligands stacked along the walls lowers the electronic band gap of the material by ca. 1 eV. An improved electron delocalization through the guest-mediated π-donor/acceptor stacks is attributed to the diminished band gap of the doped material, which forecasts an improved electrical conductivity.