Ultrafast Negative Capacitance Transition for 2d Ferroelectric MoS 2 /graphene Transistor.

Negative capacitance gives rise to subthreshold swing (SS) below the fundamental limit by efficient modulation of surface potential in transistors. While negative-capacitance transition was reported in polycrystalline Pb(Zr 0.2 Ti 0.8 )O 3 and HfZrO 2 thin-films in few microseconds timescale, low SS was not persistent over a wide range of drain current when used instead of conventional dielectrics. In this work, the clear nano-second negative transition states in two-dimensional single-crystal CuInP 2 S 6 (CIPS) flakes have been demonstrated by an alternative fast-transient measurement technique. Further integrating this ultrafast NC transition with the localized density of states of Dirac contacts and controlled charge transfer in the CIPS/channel (MoS 2 /graphene) a state-of-the-art device architecture, negative capacitance Dirac source drain field effect transistor (NCDSD-FET) is introduced. This yields an ultralow SS of 4.8 mV/dec with an average sub-10 SS across five decades with on-off ratio exceeding 10 7 , by simultaneous improvement of transport and body factors in monolayer MoS 2 -based FET, outperforming all previous reports. This approach could pave the way to achieve ultralow-SS FETs for future high-speed and low-power electronics. This article is protected by copyright. All rights reserved.