Preparation of Nanoscale Urushiol/PAN Films to Evaluate Their Acid Resistance and Protection of Functional PVP Films.

Different amounts of urushiol were added to a fixed amount of polyacrylonitrile (PAN) to make nanoscale urushiol/PAN films by the electrospinning method. Electrospinning solutions were prepared by using dimethylformamide (DMF) as the solvent. Nanoscale urushiol/PAN films and conductive Poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)(PEDOT:PSS)/polyvinyl pyrrolidone (PVP) films were prepared by electrospinning. In order to prepare an electrospun sandwich nanoscale film, urushiol/PAN films were deposited as both the top and bottom layers and PEDOT:PSS/PVP film as the inner layer. When the PAN to urushiol ratio was 7:5, the fiber diameter ranged between 150 nm and 200 nm. The single-layer urushiol/PAN film could not be etched after being immersed into 60%, 80%, and 100% sulfuric acid (H2SO4) for 30 min, which indicated the improved acid resistance of the PAN film. The urushiol/PAN film was used to fabricate the sandwich nanoscale films. When the sandwich film was immersed into 80% and 100% H2SO4 solutions for 30 min, the structure remained intact, and the conductive PVP film retained its original properties. Thus, the working environment tolerability of the functional PVP film was increased.