Chul-Hee Cho (Chulhee Cho)

Publication Activity (10 Years)

Years Active: 2022-2023
Publications (10 Years): 19

Top Topics

Energy Transfer

Magnetic Nanoparticles

Top Venues

Materials (Basel, Switzerland)

Sensors (Basel, Switzerland)

Nanomaterials (Basel, Switzerland)

This page only lists publications with an associated author ORCID identifier.

Publications

In-Ho Seong, Si-Jun Kim, Young-Seok Lee, Chul-Hee Cho, Wonnyoung Jeong, Yebin You, Minsu Choi, Byeongyeop Choi, Shin-Jae You
On the Quenching of Electron Temperature in Inductively Coupled Plasma. Materials (Basel, Switzerland) 16 (8) (2023)
In-Ho Seong, Si-Jun Kim, Minsu Choi, Woobeen Lee, Wonnyoung Jeong, Chul-Hee Cho, Yebin You, Young-Seok Lee, Youbin Seol, Shin-Jae You
Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma. Materials (Basel, Switzerland) 16 (17) (2023)
Si-Jun Kim, Min-Su Choi, Sang-Ho Lee, Won-Nyoung Jeong, Young-Seok Lee, In-Ho Seong, Chul-Hee Cho, Dae-Woong Kim, Shin-Jae You
Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process. Sensors (Basel, Switzerland) 23 (5) (2023)
In-Ho Seong, Si-Jun Kim, Young-Seok Lee, Chul-Hee Cho, Wonnyoung Jeong, Yebin You, Minsu Choi, Byeongyeop Choi, Shin-Jae You
On the Quenching of Electron Temperature in Inductively Coupled Plasma. Materials (Basel, Switzerland) 16 (8) (2023)
In-Ho Seong, Si-Jun Kim, Young-Seok Lee, Chul-Hee Cho, Wonnyoung Jeong, Yebin You, Minsu Choi, Byeongyeop Choi, Shin-Jae You
On the Quenching of Electron Temperature in Inductively Coupled Plasma. Materials (Basel, Switzerland) 16 (8) (2023)
Minsu Choi, Young-Seok Lee, Ye-Bin You, Chul-Hee Cho, Wonnyoung Jeong, In-Ho Seong, Byeongyeop Choi, Sijun Kim, Youbin Seol, Shinjae You, Geun Young Yeom
Characterization of SiO 2 Plasma Etching with Perfluorocarbon (C 4 F 8 and C 6 F 6 ) and Hydrofluorocarbon (CHF 3 and C 4 H 2 F 6 ) Precursors for the Greenhouse Gas Emissions Reduction. Materials (Basel, Switzerland) 16 (16) (2023)
Chul-Hee Cho, Si-Jun Kim, Young-Seok Lee, In-Ho Seong, Wonnyoung Jeong, Yebin You, Minsu Choi, Shin-Jae You
Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method. Materials (Basel, Switzerland) 16 (7) (2023)
Si-Jun Kim, Min-Su Choi, Sang-Ho Lee, Won-Nyoung Jeong, Young-Seok Lee, In-Ho Seong, Chul-Hee Cho, Dae-Woong Kim, Shin-Jae You
Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process. Sensors (Basel, Switzerland) 23 (5) (2023)
Wonnyoung Jeong, Si-Jun Kim, Young-Seok Lee, Chul-Hee Cho, In-Ho Seong, Yebin You, Minsu Choi, Jangjae Lee, Youbin Seol, Shin-Jae You
Contribution of Ion Energy and Flux on High-Aspect Ratio SiO 2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C 4 F 8 Plasma: Individual Ion Energy and Flux Controlled. Materials (Basel, Switzerland) 16 (10) (2023)
Young-Seok Lee, Si-Jun Kim, Jang-Jae Lee, Chul-Hee Cho, In-Ho Seong, Shinjae You
Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO 2 . Sensors (Basel, Switzerland) 22 (16) (2022)
Won-Nyoung Jeong, Young-Seok Lee, Chul-Hee Cho, In-Ho Seong, Shin-Jae You
Investigation into SiO 2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled. Nanomaterials (Basel, Switzerland) 12 (24) (2022)
Ye-Bin You, Young-Seok Lee, Si-Jun Kim, Chul-Hee Cho, In-Ho Seong, Won-Nyoung Jeong, Min-Su Choi, Shin-Jae You
Influence of Additive N 2 on O 2 Plasma Ashing Process in Inductively Coupled Plasma. Nanomaterials (Basel, Switzerland) 12 (21) (2022)
Won-Nyoung Jeong, Young-Seok Lee, Chul-Hee Cho, In-Ho Seong, Shin-Jae You
Investigation into SiO 2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled. Nanomaterials (Basel, Switzerland) 12 (24) (2022)
Si-Jun Kim, In-Ho Seong, Young-Seok Lee, Chul-Hee Cho, Won-Nyoung Jeong, Ye-Bin You, Jang-Jae Lee, Shin-Jae You
Development of a High-Linearity Voltage and Current Probe with a Floating Toroidal Coil: Principle, Demonstration, Design Optimization, and Evaluation. Sensors (Basel, Switzerland) 22 (15) (2022)
Si-Jun Kim, Sang-Ho Lee, Ye-Bin You, Young-Seok Lee, In-Ho Seong, Chul-Hee Cho, Jang-Jae Lee, Shin-Jae You
Development of the Measurement of Lateral Electron Density (MOLE) Probe Applicable to Low-Pressure Plasma Diagnostics. Sensors (Basel, Switzerland) 22 (15) (2022)
In-Ho Seong, Si-Jun Kim, Young-Seok Lee, Chul-Hee Cho, Jang-Jae Lee, Wonnyoung Jeong, Yebin You, Shin-Jae You
Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath. Sensors (Basel, Switzerland) 22 (16) (2022)
In-Ho Seong, Jinho Lee, Si-Jun Kim, Young-Seok Lee, Chul-Hee Cho, Jang-Jae Lee, Wonnyoung Jeong, Yebin You, Shin-Jae You
Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma. Nanomaterials (Basel, Switzerland) 12 (22) (2022)
Chul-Hee Cho, Sijun Kim, Young-Seok Lee, Wonnyoung Jeong, In-Ho Seong, Jang-Jae Lee, Minsu Choi, Yebin You, Sangho Lee, Jinho Lee, Shinjae You
Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma. Sensors (Basel, Switzerland) 22 (17) (2022)
Won-Nyoung Jeong, Young-Seok Lee, Chul-Hee Cho, In-Ho Seong, Shin-Jae You
Investigation into SiO 2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled. Nanomaterials (Basel, Switzerland) 12 (24) (2022)