Tania E Sandoval (T E Sandoval)

ORCID

Publication Activity (10 Years)

Years Active: 2017-2024
Publications (10 Years): 10

Top Venues

The journal of physical chemistry letters

Journal of the American Chemical Society

Langmuir : the ACS journal of surfaces and colloids

The journal of physical chemistry. C, Nanomaterials and interfaces

Stanford University (PHD)

This page only lists publications with an associated author ORCID identifier.

Education History

Stanford University - Mar 13 2018

United States

PHD :: Chemical Engineering

Stanford University

United States

MSC :: Chemical Engineering

Publications

Ilker Tezsevin, J H Deijkers, Marc J M Merkx, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes. The journal of physical chemistry letters (2024)
Ilker Tezsevin, J H Deijkers, Marc J M Merkx, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes. The journal of physical chemistry letters 15 (29) (2024)
Ilker Tezsevin, J H Deijkers, Marc J M Merkx, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes. The journal of physical chemistry letters 15 (29) (2024)
Ilker Tezsevin, J H Deijkers, Marc J M Merkx, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes. The journal of physical chemistry letters 15 (29) (2024)
Ilker Tezsevin, J H Deijkers, Marc J M Merkx, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes. The journal of physical chemistry letters 15 (29) (2024)
Ilker Tezsevin, J F W Maas, Marc J M Merkx, R Lengers, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor. Langmuir : the ACS journal of surfaces and colloids (2023)
Marc J M Merkx, Athanasios Angelidis, Alfredo Mameli, Jun Li, Paul C Lemaire, Kashish Sharma, Dennis M Hausmann, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors. The journal of physical chemistry. C, Nanomaterials and interfaces 126 (10) (2022)
Il-Kwon Oh, Tania E Sandoval, Tzu-Ling Liu, Nathaniel E Richey, Chi Thang Nguyen, Bonwook Gu, Han-Bo-Ram Lee, Ralf Tonner, Stacey F Bent
Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al 2 O 3 with a Series of Al(CH 3 ) x Cl 3- x and Al(C y H 2 y +1 ) 3 Precursors. Journal of the American Chemical Society 144 (26) (2022)
Bonggeun Shong, Jong Suk Yoo, Tania E Sandoval, Stacey F Bent
Formation of Germa-ketenimine on the Ge(100) Surface by Adsorption of tert-Butyl Isocyanide. Journal of the American Chemical Society 139 (25) (2017)
Tania E Sandoval, Stacey F Bent
Adsorption of Homotrifunctional 1,2,3-Benzenetriol on a Ge(100)-2 × 1 Surface. Langmuir : the ACS journal of surfaces and colloids 33 (35) (2017)

Tania E Sandoval.css-eqlu8i{font-size:small;padding-left:4px;} (T E Sandoval)

Publication Activity (10 Years)

Top Topics

Top Venues

Tania E Sandoval (T E Sandoval)