Wilhelmus Erwin M M Kessels (Wilhelmus M M Kessels, W M M Erwin Kessels, W M M Kessels, Wilhelmus M M Erwin Kessels)

Publication Activity (10 Years)

Years Active: 2017-2024
Publications (10 Years): 41

Top Topics

High Efficiency

Electron Microscopy

Walled Carbon Nanotubes

Top Venues

ACS applied nano materials

ACS applied materials & interfaces

The journal of physical chemistry letters

The journal of physical chemistry. C, Nanomaterials and interfaces

This page only lists publications with an associated author ORCID identifier.

Publications

Wilhelmus J H Willem-Jan Berghuis, Marvin A J van Tilburg, Wouter H J Peeters, Victor T van Lange, Riccardo Farina, Elham M T Fadaly, Elsa C M Renirie, Roel J Theeuwes, Marcel A Verheijen, Bart Macco, Erik P A M Bakkers, Jos E M Haverkort, Wilhelmus Erwin M M Kessels
Low Surface Recombination in Hexagonal SiGe Alloy Nanowires: Implications for SiGe-Based Nanolasers. ACS applied nano materials 7 (2) (2024)
Jeff J P M Schulpen, Cindy H X Lam, Rebecca A Dawley, Ruixue Li, Lun Jin, Tao Ma, Wilhelmus Erwin M M Kessels, Steven J Koester, Ageeth A Bol
Nb Doping and Alloying of 2D WS 2 by Atomic Layer Deposition for 2D Transition Metal Dichalcogenide Transistors and HER Electrocatalysts. ACS applied nano materials 7 (7) (2024)
Ilker Tezsevin, J H Deijkers, Marc J M Merkx, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes. The journal of physical chemistry letters (2024)
Ilker Tezsevin, J H Deijkers, Marc J M Merkx, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes. The journal of physical chemistry letters 15 (29) (2024)
Jeff J P M Schulpen, Cindy H X Lam, Rebecca A Dawley, Ruixue Li, Lun Jin, Tao Ma, Wilhelmus Erwin M M Kessels, Steven J Koester, Ageeth A Bol
Nb Doping and Alloying of 2D WS 2 by Atomic Layer Deposition for 2D Transition Metal Dichalcogenide Transistors and HER Electrocatalysts. ACS applied nano materials 7 (7) (2024)
Miika Mattinen, Wei Chen, Rebecca A Dawley, Marcel A Verheijen, Emiel J M Hensen, Wilhelmus Erwin M M Kessels, Ageeth A Bol
Structural Aspects of MoS x Prepared by Atomic Layer Deposition for Hydrogen Evolution Reaction. ACS catalysis 14 (13) (2024)
Jeff J P M Schulpen, Cindy H X Lam, Rebecca A Dawley, Ruixue Li, Lun Jin, Tao Ma, Wilhelmus Erwin M M Kessels, Steven J Koester, Ageeth A Bol
Nb Doping and Alloying of 2D WS 2 by Atomic Layer Deposition for 2D Transition Metal Dichalcogenide Transistors and HER Electrocatalysts. ACS applied nano materials 7 (7) (2024)
Ilker Tezsevin, J H Deijkers, Marc J M Merkx, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes. The journal of physical chemistry letters 15 (29) (2024)
Jeff J P M Schulpen, Cindy H X Lam, Rebecca A Dawley, Ruixue Li, Lun Jin, Tao Ma, Wilhelmus Erwin M M Kessels, Steven J Koester, Ageeth A Bol
Nb Doping and Alloying of 2D WS 2 by Atomic Layer Deposition for 2D Transition Metal Dichalcogenide Transistors and HER Electrocatalysts. ACS applied nano materials 7 (7) (2024)
Ilker Tezsevin, J H Deijkers, Marc J M Merkx, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes. The journal of physical chemistry letters 15 (29) (2024)
Miika Mattinen, Wei Chen, Rebecca A Dawley, Marcel A Verheijen, Emiel J M Hensen, Wilhelmus Erwin M M Kessels, Ageeth A Bol
Structural Aspects of MoS x Prepared by Atomic Layer Deposition for Hydrogen Evolution Reaction. ACS catalysis 14 (13) (2024)
Reyhaneh Mahlouji, Yue Zhang, Marcel A Verheijen, Saurabh Karwal, Jan Philipp Hofmann, Wilhelmus Erwin M M Kessels, Ageeth A Bol
Influence of High-κ Dielectrics Integration on ALD-Based MoS 2 Field-Effect Transistor Performance. ACS applied nano materials 7 (16) (2024)
Reyhaneh Mahlouji, Yue Zhang, Marcel A Verheijen, Saurabh Karwal, Jan Philipp Hofmann, Wilhelmus Erwin M M Kessels, Ageeth A Bol
Influence of High-κ Dielectrics Integration on ALD-Based MoS 2 Field-Effect Transistor Performance. ACS applied nano materials 7 (16) (2024)
Jeff J P M Schulpen, Cindy H X Lam, Rebecca A Dawley, Ruixue Li, Lun Jin, Tao Ma, Wilhelmus Erwin M M Kessels, Steven J Koester, Ageeth A Bol
Correction to Nb Doping and Alloying of 2D WS 2 by Atomic Layer Deposition for 2D Transition Metal Dichalcogenide Transistors and HER Electrocatalysts. ACS applied nano materials 7 (10) (2024)
Wilhelmus J H Willem-Jan Berghuis, Marvin A J van Tilburg, Wouter H J Peeters, Victor T van Lange, Riccardo Farina, Elham M T Fadaly, Elsa C M Renirie, Roel J Theeuwes, Marcel A Verheijen, Bart Macco, Erik P A M Bakkers, Jos E M Haverkort, Wilhelmus Erwin M M Kessels
Low Surface Recombination in Hexagonal SiGe Alloy Nanowires: Implications for SiGe-Based Nanolasers. ACS applied nano materials 7 (2) (2024)
Ilker Tezsevin, J H Deijkers, Marc J M Merkx, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes. The journal of physical chemistry letters 15 (29) (2024)
Reyhaneh Mahlouji, Wilhelmus Erwin M M Kessels, Abhay A Sagade, Ageeth A Bol
ALD-grown two-dimensional TiS x metal contacts for MoS 2 field-effect transistors. Nanoscale advances 5 (18) (2023)
Miika Mattinen, Jeff J P M Schulpen, Rebecca A Dawley, Farzan Gity, Marcel A Verheijen, Wilhelmus Erwin M M Kessels, Ageeth A Bol
Toolbox of Advanced Atomic Layer Deposition Processes for Tailoring Large-Area MoS 2 Thin Films at 150 °C. ACS applied materials & interfaces (2023)
Yifeng Zhao, Kunal Datta, Nga Phung, Andrea E A Bracesco, Valerio Zardetto, Giulia Paggiaro, Hanchen Liu, Mohua Fardousi, Rudi Santbergen, Paul Procel Moya, Can Han, Guangtao Yang, Junke Wang, Dong Zhang, Bas T van Gorkom, Tom P A van der Pol, Michael Verhage, Martijn M Wienk, Wilhelmus Erwin M M Kessels, Arthur Weeber, Miro Zeman, Luana Mazzarella, Mariadriana Creatore, René A J Janssen, Olindo Isabella
Optical Simulation-Aided Design and Engineering of Monolithic Perovskite/Silicon Tandem Solar Cells. ACS applied energy materials 6 (10) (2023)
Andrea E A Bracesco, Jarvi W P Jansen, Haibo Xue, Valerio Zardetto, Geert Brocks, Wilhelmus Erwin M M Kessels, Shuxia Tao, Mariadriana Creatore
In Situ IR Spectroscopy Studies of Atomic Layer-Deposited SnO 2 on Formamidinium-Based Lead Halide Perovskite. ACS applied materials & interfaces (2023)
Ilker Tezsevin, J F W Maas, Marc J M Merkx, R Lengers, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor. Langmuir : the ACS journal of surfaces and colloids (2023)
Miika Mattinen, Farzan Gity, Emma Coleman, Joris F A Vonk, Marcel A Verheijen, Ray Duffy, Wilhelmus Erwin M M Kessels, Ageeth A Bol
Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100 °C through Control of Plasma Chemistry. Chemistry of materials : a publication of the American Chemical Society 34 (16) (2022)
Marc J M Merkx, Athanasios Angelidis, Alfredo Mameli, Jun Li, Paul C Lemaire, Kashish Sharma, Dennis M Hausmann, Wilhelmus Erwin M M Kessels, Tania E Sandoval, Adriaan J M Mackus
Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors. The journal of physical chemistry. C, Nanomaterials and interfaces 126 (10) (2022)
Sven H Gerritsen, Nicholas J Chittock, Vincent Vandalon, Marcel A Verheijen, Harm C M Knoops, Wilhelmus Erwin M M Kessels, Adriaan J M Mackus
Surface Smoothing by Atomic Layer Deposition and Etching for the Fabrication of Nanodevices. ACS applied nano materials 5 (12) (2022)
Vincent Vandalon, Adriaan J M Mackus, Wilhelmus Erwin M M Kessels
Surface Chemistry during Atomic Layer Deposition of Pt Studied with Vibrational Sum-Frequency Generation. The journal of physical chemistry. C, Nanomaterials and interfaces 126 (5) (2022)
Vivek Beladiya, Tahsin Faraz, Paul Schmitt, Anne-Sophie Munser, Sven Schröder, Sebastian Riese, Christian Mühlig, Daniel Schachtler, Fabian Steger, Roelene Botha, Felix Otto, Torsten Fritz, Christian van Helvoirt, Wilhelmus Erwin M M Kessels, Hassan Gargouri, Adriana Szeghalmi
Plasma-Enhanced Atomic Layer Deposition of HfO 2 with Substrate Biasing: Thin Films for High-Reflective Mirrors. ACS applied materials & interfaces 14 (12) (2022)
Sven H Gerritsen, Nicholas J Chittock, Vincent Vandalon, Marcel A Verheijen, Harm C M Knoops, Wilhelmus Erwin M M Kessels, Adriaan J M Mackus
Surface Smoothing by Atomic Layer Deposition and Etching for the Fabrication of Nanodevices. ACS applied nano materials 5 (12) (2022)
Karsten Arts, Harvey Thepass, Marcel A Verheijen, Riikka L Puurunen, Wilhelmus Erwin M M Kessels, Harm C M Knoops
Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2. Chemistry of materials : a publication of the American Chemical Society 33 (13) (2021)
Roel J Theeuwes, Jimmy Melskens, Lachlan E Black, Wolfhard Beyer, Dibyashree Koushik, Wilhelmus J H Willem-Jan Berghuis, Bart Macco, Wilhelmus Erwin M M Kessels
PO x /Al2O3 Stacks for c-Si Surface Passivation: Material and Interface Properties. ACS applied electronic materials 3 (10) (2021)
Reyhaneh Mahlouji, Yue Zhang, Marcel A Verheijen, Jan Philipp Hofmann, Wilhelmus Erwin M M Kessels, Abhay A Sagade, Ageeth A Bol
On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance. ACS applied electronic materials 3 (7) (2021)
M A Mione, Vincent Vandalon, Alfredo Mameli, Wilhelmus Erwin M M Kessels, F Roozeboom
Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy. The journal of physical chemistry. C, Nanomaterials and interfaces 125 (45) (2021)
Karsten Arts, Sanne Deijkers, Riikka L Puurunen, Wilhelmus Erwin M M Kessels, Harm C M Knoops
Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2. The journal of physical chemistry. C, Nanomaterials and interfaces 125 (15) (2021)
Shashank Balasubramanyam, Matthew A Bloodgood, Mark van Ommeren, Tahsin Faraz, Vincent Vandalon, Wilhelmus Erwin M M Kessels, Marcel A Verheijen, Ageeth A Bol
Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers. ACS applied materials & interfaces 12 (3) (2020)
Yao Jing, Marc J M Merkx, Jiaming Cai, Kun Cao, Wilhelmus Erwin M M Kessels, Adriaan J M Mackus, Rong Chen
Nanoscale Encapsulation of Perovskite Nanocrystal Luminescent Films via Plasma-Enhanced SiO2 Atomic Layer Deposition. ACS applied materials & interfaces 12 (47) (2020)
Vincent Vandalon, Wilhelmus Erwin M M Kessels
Initial Growth Study of Atomic-Layer Deposition of Al2O3 by Vibrational Sum-Frequency Generation. Langmuir : the ACS journal of surfaces and colloids 35 (32) (2019)
Dibyashree Koushik, Lotte Hazendonk, Valerio Zardetto, Vincent Vandalon, Marcel A Verheijen, Wilhelmus Erwin M M Kessels, Mariadriana Creatore
Chemical Analysis of the Interface between Hybrid Organic-Inorganic Perovskite and Atomic Layer Deposited Al2O3. ACS applied materials & interfaces 11 (5) (2019)
Yinghuan Kuang, Valerio Zardetto, Roderick van Gils, Saurabh Karwal, Dibyashree Koushik, Marcel A Verheijen, Lachlan E Black, Christ Weijtens, Sjoerd Veenstra, Ronn Andriessen, Wilhelmus Erwin M M Kessels, Mariadriana Creatore
Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells. ACS applied materials & interfaces 10 (36) (2018)
Tahsin Faraz, Harm C M Knoops, Marcel A Verheijen, Cristian A A van Helvoirt, Saurabh Karwal, Akhil Sharma, Vivek Beladiya, Adriana Szeghalmi, Dennis M Hausmann, Jon Henri, Mariadriana Creatore, Wilhelmus Erwin M M Kessels
Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies. ACS applied materials & interfaces 10 (15) (2018)
Alfredo Mameli, M A Verheijen, Adriaan J M Mackus, Wilhelmus Erwin M M Kessels, F Roozeboom
Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O2 Plasma. ACS applied materials & interfaces 10 (44) (2018)
Lachlan E Black, Alessandro Cavalli, M A Verheijen, Jos E M Haverkort, Erik P A M Bakkers, Wilhelmus Erwin M M Kessels
Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer. Nano letters 17 (10) (2017)
Alfredo Mameli, Marc J M Merkx, Bora Karasulu, Fred Roozeboom, Wilhelmus Erwin M M Kessels, Adriaan J M Mackus
Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle. ACS nano 11 (9) (2017)