Riikka L Puurunen

ResearcherID Scopus Author ID ORCID

Publication Activity (10 Years)

Years Active: 2019-2024
Publications (10 Years): 7

Top Venues

Physical chemistry chemical physics : PCCP

The journal of physical chemistry. C, Nanomaterials and interfaces

Chemistry of materials : a publication of the American Chemical Society

Nanomaterials (Basel, Switzerland)

Kemian tekniikan korkeakoulu, Aalto-yliopisto

Helsinki University of Technology (PHD)

This page only lists publications with an associated author ORCID identifier.

Affiliation History

Kemian tekniikan korkeakoulu, Aalto-yliopisto Feb 01 2017

Finland

Associate Professor

VTT Oct 06 2004 - Jul 31 2017

Finland

Senior Scientist

Education History

Helsinki University of Technology

Finland

PHD :: Chemical Technology

Publications

Niko Heikkinen, Juha Lehtonen, Riikka L Puurunen
An atomic layer deposition diffusion-reaction model for porous media with different particle geometries. Physical chemistry chemical physics : PCCP (2024)
Niko Heikkinen, Juha Lehtonen, Riikka L Puurunen
An atomic layer deposition diffusion-reaction model for porous media with different particle geometries. Physical chemistry chemical physics : PCCP 26 (9) (2024)
Jänis Järvilehto, Jorge A Velasco, Jihong Yim, Christine Gonsalves, Riikka L Puurunen
Simulation of conformality of ALD growth inside lateral channels: comparison between a diffusion-reaction model and a ballistic transport-reaction model. Physical chemistry chemical physics : PCCP (2023)
Jihong Yim, Emma Verkama, Jorge A Velasco, Karsten Arts, Riikka L Puurunen
Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile. Physical chemistry chemical physics : PCCP 24 (15) (2022)
Karsten Arts, Harvey Thepass, Marcel A Verheijen, Riikka L Puurunen, Wilhelmus Erwin M M Kessels, Harm C M Knoops
Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2. Chemistry of materials : a publication of the American Chemical Society 33 (13) (2021)
Karsten Arts, Sanne Deijkers, Riikka L Puurunen, Wilhelmus Erwin M M Kessels, Harm C M Knoops
Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2. The journal of physical chemistry. C, Nanomaterials and interfaces 125 (15) (2021)
Alireza M Kia, Nora Haufe, Sajjad Esmaeili, Clemens Mart, Mikko Utriainen, Riikka L Puurunen, Wenke Weinreich
ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition. Nanomaterials (Basel, Switzerland) 9 (7) (2019)

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Publication Activity (10 Years)

Top Topics

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Riikka L Puurunen